By Fred M. Dickey, Todd E. Lizotte
"Since the appearance of the laser, many functions have required shaping the laser beam irradiance profile. a number of the basic functions comprise fabric processing, together with welding, slicing, and drilling; and scientific systems, resembling corneal surgical procedure and beauty dermis remedies. different functions comprise laser/material interplay experiences, lithography, semiconductor manufacture, picture arts, optical data processing, and armed forces makes use of. Laser Beam Shaping functions is a spouse to Laser Beam Shaping: thought and methods. It treats intimately how laser beam shaping is carried out in different significant applications"-- Read more...
summary: "Since the appearance of the laser, many functions have required shaping the laser beam irradiance profile. many of the fundamental purposes comprise fabric processing, together with welding, slicing, and drilling; and scientific tactics, akin to corneal surgical procedure and beauty dermis remedies. different purposes comprise laser/material interplay reviews, lithography, semiconductor manufacture, photograph arts, optical facts processing, and army makes use of. Laser Beam Shaping purposes is a better half to Laser Beam Shaping: concept and methods. It treats intimately how laser beam shaping is carried out in different significant purposes"
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Additional info for Laser Beam Shaping Applications
This can be thought of as the number of photons within a volume of area times solid angle. As this light travels through an optical system, the brightness can be decreased by such actions as scatter and absorption but cannot be increased; this is the brightness theorem. The term etendué also includes the light’s spectrum and polarization. If a source is polarized, the energy within a unit of etendué can be increased by combining light of a secondary source of the orthogonal polarization with a polarizing beamsplitter.
This might seem convoluted, but it does generate a unitless value that pertains to the edges of the image that influences lithographic performance more than the peak and valleys. For now, we will use modulation, which is still useful. 75 NA projection lens with no wavefront aberration and random polarization. The partial coherence factor σ describes only the perimeter of the illumination cone at the reticle, whereas the distribution within that perimeter also influences the performance of the imaging.
4 Source Mask Optimization Phase shift masks (PSM) and optical proximity correction (OPC) are modifications of a standard reticle that can increase the process window. The term mask and reticle are interchangeable. The PSM have phase features that do no block, but alter the phase of the wavefront. OPC are unresolvable features near the main feature that diffract in a way to increase the NILS through focus. 28 The PSM 20 Laser Beam Shaping Applications masks are often improved by low-sigma illumination and OPC by polarization.